Degradation of high-K LA2O3 gate dielectrics using progressive electrical stress

E. Miranda*, J. Molina, Y. Kim, H. Iwai

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Fingerprint Dive into the research topics of 'Degradation of high-K LA<sub>2</sub>O<sub>3</sub> gate dielectrics using progressive electrical stress'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy