Decomposition of trimethyl indium on Si (111)-7 × 7 studied with XPS, UPS and HREELS

Y. Bu*, Jason C.S. Chu, Ming-Chang Lin

*Corresponding author for this work

Research output: Contribution to journalArticle

13 Scopus citations

Abstract

The techniques of XPS, UPS and HREELS are utilized to investigate the thermal decomposition of trimethyl indium (TMIn) on Si (111) -7 × 7. At 120 K, TMIn was primarily molecularly adsorbed on the surface. As the sample was annealed at higher temperatures, species such as CH3, CH2, In, C and H, etc., were identified. At temperatures above 950 K, SiC was the only species detected.

Original languageEnglish
Pages (from-to)207-213
Number of pages7
JournalMaterials Letters
Volume14
Issue number4
DOIs
StatePublished - 1 Jan 1992

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