Coulomb tunneling anomaly in disordered copper-germanium alloys

Shih-ying Hsu*, I. C. Wang, J. T. Liao

*Corresponding author for this work

Research output: Contribution to journalConference article

3 Scopus citations

Abstract

We have performed electronic tunneling density of states and resistivity measurements in three-dimensional CuxGe100-x films spanning the weakly and strongly localized regimes. We found that the Coulomb anomaly in tunneling density of states in the strongly disordered regime is very profound and grows in strength with resistivity. However, when the system becomes less disorderly and approaches the weakly disordered regime, this anomaly weakens rapidly. The data suggest that the disorder enhanced electron-electron interaction effects can drive the crossover from weak disorder to strong disorder in CuGe alloy system.

Original languageEnglish
Pages (from-to)196-199
Number of pages4
JournalPhysica B: Condensed Matter
Volume279
Issue number1-3
DOIs
StatePublished - 1 Jan 2000
EventThe 5th International Conference on Electrical Transport and Optical Properties of Inhomogeneous Media (ETOPIM5) - Kowloon Tong, Hong Kong
Duration: 21 Jun 199925 Jun 1999

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