We present the technology trend and attributes of 1.8 V and lower VDD CMOS ULSI for future high-performance and low-power applications. Key technology challenges and opportunities such as thin gate dielectric, multiple/tunable Vt, SOI, mixed-voltage I/O interface, low operating temperature, and embedded system-on-a-chip features, will be addressed.
|Number of pages||5|
|State||Published - 1997|
|Event||Proceedings of the 1997 International Symposium on VLSI Technology, Systems, and Applications - Taipei, China|
Duration: 3 Jun 1997 → 5 Jun 1997
|Conference||Proceedings of the 1997 International Symposium on VLSI Technology, Systems, and Applications|
|Period||3/06/97 → 5/06/97|