CMOS and interconnect reliability - Reliability of thin oxides

H. Iwai*, J. Suñé

*Corresponding author for this work

Research output: Contribution to journalShort surveypeer-review

Original languageEnglish
Pages (from-to)321
Number of pages1
JournalTechnical Digest - International Electron Devices Meeting
StatePublished - 2000
Event2000 IEEE International Electron Devices Meeting - San Francisco, CA, United States
Duration: 10 Dec 200013 Dec 2000

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