Chemical vapor deposition of diamond on silicon substrates coated with adamantane in glycol chemical solutions

Yi Chun Chen, Li Chang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Diamonds were synthesized on adamantane-coated mirror-polished Si (100) substrates by microwave plasma chemical vapor deposition (MPCVD) using a gas mixture of H2 and CH4. Before MPCVD deposition, Si substrates were dip-coated in chemical solutions of ethylene glycol and diethylene glycol with adamantane. With the coating of adamantane, the diamond nucleation can be enhanced with a density over 1 × 108 cm -2 and the deposited diamond films are shown to be of good crystallinity by scanning electron microscopy and Raman spectrometry. The study demonstrates a simple and efficient way of diamond deposition on a smooth Si substrate.

Original languageEnglish
Pages (from-to)1514-1518
Number of pages5
JournalRSC Advances
Volume3
Issue number5
DOIs
StatePublished - 7 Feb 2013

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