Chemical precursor for the synthesis of diamond films at low temperature

Rajanish N. Tiwari, Li Chang

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


In this study, diamond films have been synthesized on adamantane-coated (100) Si substrates at 530 °C by microwave plasma chemical vapor deposition from a gaseous mixture of methane and hydrogen. Scanning electron microscopy, Raman spectroscopy, and X-ray diffraction were employed to characterize the carbon chemical species on the Si substrate from adamantane into diamond. These measurements provide definitive evidence for formation of high-crystalline diamond film on Si substrate without any other pretreatments. Moreover, the possible mechanisms for the diamond formation are presented.

Original languageEnglish
Article number045501
Number of pages3
JournalApplied Physics Express
Issue number4
StatePublished - 1 Apr 2010

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