Chemical bath deposition of IrO2 films on ITO substrate

Jing Yu Chen, Yong Min Chen, Yu Sun, Jyh Fu Lee, San-Yuan Chen, Po Chun Chen*, Pu-Wei Wu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

A chemical bath is shown to deposit an IrO2 film on an ITO substrate. The chemical bath is prepared by mixing an Ir precursor (Na 3IrCl6·xH2O), an oxidizer (NaClO), a complexing agent (NaNO2), and a complex agent/stabilizer (NaOH) in an aqueous solution at a molar ratio of 1:1.5:10:30. From the UV-vis absorption spectra, complexes such as [Ir(OH)6]m3-, [Ir(NO 2)4Cl2]3-, and [Ir(NO 2)3Cl3]3- are identified. These complexes are relatively stable, minimizing the undesirable homogeneous precipitation of IrO2 nanoparticles in favor of the heterogeneous growth of the IrO2 film on the ITO substrate. Diffraction patterns from the as-deposited IrO2 film reveal an amorphous structure. In addition, profiles from X-ray absorption spectroscopy and X-ray photoelectron spectroscopy indicate that the oxidation state of the Ir in the as-deposited IrO2 film is +4. Thermogravimetric analysis confirms the inclusion of 10 wt% hydrated water in the as-deposited IrO2 film. Scanning electron microscope images reveal a continuous solid film with a smooth surface. The amorphous IrO2 film becomes rutile IrO2 phase after a mild heat treatment in air.

Original languageEnglish
Pages (from-to)14983-14990
Number of pages8
JournalCeramics International
Volume40
Issue number9 PART B
DOIs
StatePublished - 1 Jan 2014

Keywords

  • Chemical bath deposition
  • Indium tin oxide
  • Iridium oxide
  • Thin film

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