Charge storage characteristics of Mo nanocrystal dependence on Mo oxide reduction

Chao Cheng Lin*, Ting Chang Chang, Chun Hao Tu, Wei Ren Chen, Chih Wei Hu, Simon M. Sze, Tseung-Yuen Tseng, Sheng Chi Chen, Jian Yang Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

An oxygen incorporated Mo silicide was explored to form the Mo nanocrystals after rapid thermal annealing. Transmission electron microscopy showed the nanocrystals embedded in SiOx. Charge storage characteristics of Mo nanocrystals influenced by the Mo oxide and the surrounding oxide were investigated through x-ray photoelectron spectroscopy and the electrical measurement. X-ray photoelectron spectra analyses revealed the redox reaction in the oxygen incorporated Mo silicide layer after rapid thermal annealing. The memory window and retention were improved due to reduction in Mo oxide.

Original languageEnglish
Article number222101
JournalApplied Physics Letters
Volume93
Issue number22
DOIs
StatePublished - 12 Dec 2008

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