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Characterization of titanium nitride etch rate and selectivity to silicon dioxide in a Cl2 helicon-wave plasma
H. K. Chiu*, T. L. Lin, Y. Hu, K. C. Leou, Horng-Chih Lin, M. S. Tsai, T. Y. Huang
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review