Characterization and Comparison of High-k Metal-Insulator-Metal (MiM) Capacitors in 0.13 μm Cu BEOL for Mixed-Mode and RF Applications

Y. L. Tu*, H. L. Lin, L. L. Chao, Danny Wu, C. S. Tsai, C. Wang, C. F. Huang, C. H. Lin, Jack Sun

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

53 Scopus citations

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Engineering & Materials Science