Characteristics of ultraviolet nonpolar InGaN/GaN light-emitting diodes using trench epitaxial lateral overgrowth technology

Shih Chun Ling, Te Chung Wang, Tsung Shine Ko, Tien-chang Lu*, Hao-Chung Kuo, Shing Chung Wang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

Ultraviolet nonpolar InGaN/GaN light-emitting diodes grown on trench epitaxial lateral overgrowth (TELOG) a-plane GaN template by metalorganic chemical vapor deposition were fabricated. Two emission peaks at 373 and 443 nm are observed from each fabricated device. The double emission peaks feature is identified by cathodoluminescence images, which show that the ultraviolet peak is emitted from the low-defect density wings on the TELOG and the blue peak is emitted from the TELOG-coalesced seed areas due to different incorporation of indium. The L-I-V diagram revealed that there are leakage current pathways due to the many threading dislocations in seed regions, and that the output power reached 0.2 mW at 140 mA. Two electroluminescence (EL) peaks are observed simultaneously when the driving current is below 50 mA. However, the EL peak at 373 nm dominates when current is above 50 mA. In addition, the degree of polarization of the ultraviolet peak was measured and found to be 28.7%.

Original languageEnglish
Pages (from-to)2330-2333
Number of pages4
JournalJournal of Crystal Growth
Volume310
Issue number7-9
DOIs
StatePublished - 1 Apr 2008

Keywords

  • A3. Metalorganic chemical vapor deposition
  • B1. Inorganic compounds
  • B2. Semiconducting gallium compounds
  • B3. Light emitting diodes

Fingerprint Dive into the research topics of 'Characteristics of ultraviolet nonpolar InGaN/GaN light-emitting diodes using trench epitaxial lateral overgrowth technology'. Together they form a unique fingerprint.

Cite this