Characteristics of Pb(Zr,Ti)O3 thin films deposited on Pt(Si) at low substrate temperature by using Ba(Mg1/3Ta2/3)O 3 as buffer layer

Ying-hao Chu*, Su Jien Lin, Kuo Shung Liu, I. Nan Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


Growth behavior of Ba(Mg1/33Ta2/3)O 3/Pb(Zr,Ti)O3/Ba(Mg1/3Ta2/3)O 3, BMT/PZT/BMT, heterostructure on Pt-coated silicon substrate (Pt(Si)) by using in-situ pulsed laser deposition process was systematically examined. The crystallographic orientation and microstructure of heterostructure were observed to vary with deposition parameters markedly. The BMT seeding layer enhanced the growth of PZT films, which started to crystallize at a substrate temperature as low as 350°C. The ferroelectric properties of BMT/PZT/BMT/Pt(Si) films can be optimized when the films were synthesized at 400°C substrate temperature with 0.3 mbar ambient oxygen pressure during deposition of BMT seeding layer (Pr = 29.7 μC/cm2 & Ec = 82.5 kV/cm). Fatigue of the heterostructure showed no degradation and the hysteresis loops showed essentially no change even after 1011 fatigue cycles.

Original languageEnglish
Pages (from-to)3-12
Number of pages10
JournalIntegrated Ferroelectrics
StatePublished - 1 Dec 2004


  • Ba(MgTa)O
  • Pb(Zr,Ti)O
  • Pulsed laser deposition
  • Seeding

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