Characteristics of highly orientated BiFeO3 thin films on a LaNiO3-coated Si substrate by RF sputtering

Yen Ting Liu, San-Yuan Chen, Hsin Yi Lee*

*Corresponding author for this work

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

BiFeO3 (BFO) films were grown on LaNiO3-coated Si substrate by a RF magnetron sputtering system at temperatures in the range of 300-700 °C. X-ray reflectivity and high-resolution diffraction measurements were employed to characterize the microstructure of these films. For a substrate temperature below 300 °C and at 700 °C only partially crystalline films and completely randomly polycrystalline films were grown, whereas highly (001)-orientated BFO film was obtained for a substrate temperature in the range of 400-600 °C. The crystalline quality of BFO thin films increase as the deposition temperature increase except for the film deposited at 700 °C. The fitted result from X-ray reflectivity curves show that the densities of the BFO films are slightly less than their bulk values. For the BFO films deposited at 300-600 °C, the higher the deposition temperature, the larger the remnant polarization and surface roughness of the films present.

Original languageEnglish
Pages (from-to)7412-7415
Number of pages4
JournalThin Solid Films
Volume518
Issue number24
DOIs
StatePublished - 1 Oct 2010

Keywords

  • RF sputtering
  • Thin films
  • X-ray diffraction

Fingerprint Dive into the research topics of 'Characteristics of highly orientated BiFeO<sub>3</sub> thin films on a LaNiO<sub>3</sub>-coated Si substrate by RF sputtering'. Together they form a unique fingerprint.

  • Cite this