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Boosting Ge-epi P-well mobility & crystal quality with Si or Sn implantation and melt annealing
John Borland, Shang Shuin Chaung, Tseung-Yuen Tseng, Abhijeet Joshi, Bulent Basol, Yao Jen Lee, Takashi Kuroi, Toshiyuki Tabata, Karim Huet, Gary Goodman, Nadya Khapochkina, Temel Buyuklimanli
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review