Bi3.25La0.75Ti3O12 thin films on ultrathin Al2O3 buffered Si for ferroelectric memory application

San-Yuan Chen*, Chia Liang Sun, Shi Bai Chen, Albert Chin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Abstract

We have investigated the physical and electrical properties of Bi 3.25La0.75Ti3O12 (BLT) thin films on Pt/Ti/SiO2/Si and on Al2O3(6nm)/Si, which are used for one-transistor-one-capacitor and one-transistor ferroelectric memory, respectively. The BLT thin films on both substrates show good capacitance-voltage characteristics and the same threshold voltage shift of 1.6 V at applied ±10 V bias. However, the leakage current of BLT on Al 2O3/Si at -100 kV/cm is two orders of magnitude lower than that on Pt. The comparable memory characteristics and much reduced leakage current of BLT on Al2O3/Si are the strong advantages as compared with BLT on Pt because it is directly related to switching energy and device scaling down.

Original languageEnglish
Pages (from-to)3168-3170
Number of pages3
JournalApplied Physics Letters
Volume80
Issue number17
DOIs
StatePublished - 29 Apr 2002

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