Abstract
A hybrid P/N channel junctionless (JL) thin-film transistor (TFT) with back-gate bias (V-bg) has been demonstrated. By applying negative bias of V-bg = -8V in gate length of 50 nm shows excellent SS (<90 mV/dec), a negligible drain induced barrier lowering (DIBL), increased I-on versus decreased I-off (ratio > 10(8)), and high V-th modulation. The increased I-on simultaneously decreased I-off via negative V-bg is attributed to smaller surface E-field at ON-state, significantly reducing the impact on interface traps and thinner effective channel thickness at OFF-state, improving gate controllability. Hence, hybrid P/N JL-TFT with V-bg is a promising for low power circuit, power management, and System-on-Chip applications. (C) 2015 AIP Publishing LLC.
Original language | English |
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Journal | Applied Physics Letters |
Volume | 107 |
Issue number | 18 |
DOIs | |
State | Published - 2 Nov 2015 |
Keywords
- SUBSTRATE BIAS