Atomic layer deposition prepared Al-doped ZnO for liquid crystal displays applications

Y. C. Su, C. C. Chiou, V. Marinova, Shiuan-Huei Lin, N. Bozhinov*, B. Blagoev, T. Babeva, Ken-Yuh Hsu, D. Z. Dimitrov

*Corresponding author for this work

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

Aluminum-doped zinc oxide (AZO) layers are prepared by using atomic layer deposition technique. The obtained layers possess high optical transmittance at visible and near-infrared spectral range. By varying the Al content, optimal growth compositions of AZO are established where the electrical conductivity of the film is highest. Based on performed optical and electrical characteristics measurements, selected AZO films with optimal conductivity are implemented as transparent electrodes in liquid crystal display devices. The electro-optical modulation characteristics of these devices are found to be comparable to those of devices using commercial ITO electrodes.

Original languageEnglish
Article number205
JournalOptical and Quantum Electronics
Volume50
Issue number5
DOIs
StatePublished - 1 May 2018

Keywords

  • Al-doped ZnO layers
  • ALD technique
  • Liquid crystal displays
  • Transparent conductive layers

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    Su, Y. C., Chiou, C. C., Marinova, V., Lin, S-H., Bozhinov, N., Blagoev, B., Babeva, T., Hsu, K-Y., & Dimitrov, D. Z. (2018). Atomic layer deposition prepared Al-doped ZnO for liquid crystal displays applications. Optical and Quantum Electronics, 50(5), [205]. https://doi.org/10.1007/s11082-018-1469-1