Difficulties of statistical circuit analysis for deep sub-micron CMOS technologies are discussed. The observed complex patterns of variation in device parameters make previously used methods invalid. An approach that couples the extracted SPICE parameter sets with their physical locations is advocated as an alternative.
|Number of pages||4|
|State||Published - 1 Dec 1998|
|Event||Proceedings of the 1998 3rd Internatinal Workshop on Statistical Metrology (IWSM) - Honolulu, HI, USA|
Duration: 7 Jun 1998 → 7 Jun 1998
|Conference||Proceedings of the 1998 3rd Internatinal Workshop on Statistical Metrology (IWSM)|
|City||Honolulu, HI, USA|
|Period||7/06/98 → 7/06/98|