Application of technology CAD in process development for high performance logic and system-on-chip in 1C foundry

Boon Khim Liew*, Chih Chiang Wang, Carlos H. Diaz, Shien Yang Wu, Yuan Chen Sun Jack, Yai Fen Lint, Di Son Kuqt, Hua Tai Lin, Anthony Yen

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

The application of Technology CAD simulations for development of 1C processes in foundry is presented. Examples include device design, Flash cell design and optical proximity correction for SRAM cell. The challenges of using TCAD tools in the 1C foundry is also discussed.

Original languageEnglish
Pages (from-to)1275-1279
Number of pages5
JournalIEICE Transactions on Electronics
VolumeE83-C
Issue number8
StatePublished - Aug 2000

Keywords

  • Cmos device
  • Flash, optical proximity correction
  • TCAD

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    Liew, B. K., Wang, C. C., Diaz, C. H., Wu, S. Y., Sun Jack, Y. C., Lint, Y. F., Kuqt, D. S., Lin, H. T., & Yen, A. (2000). Application of technology CAD in process development for high performance logic and system-on-chip in 1C foundry. IEICE Transactions on Electronics, E83-C(8), 1275-1279.