Antireflection and light trapping of subwavelength surface structures formed by colloidal lithography on thin film solar cells

Ping Chen Tseng, Min An Tsai, Pei-Chen Yu*, Hao-Chung Kuo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

36 Scopus citations

Abstract

In this paper, we present a novel design of a surface nanostructure that suppresses the reflectivity and provides forward diffraction for light trapping. The structure under study comprises periodic nanoislands fabricated using self-assembly polystyrene spheres, which are applicable to large-area fabrication. We also show preliminary fabrication results of the proposed structure. The periodic nanoislands reduce the reflectivity through gradient effective refractive indices and enhance light trapping through diffraction in a periodic structure. We first systematically study the antireflection and light trapping effects using a rigorous coupled-wave analysis and then calculate the short-circuit current density of a 2-μm-thick crystalline silicon with periodic nanoislands and an aluminum back reflector. The optimum short-circuit current density with periodic nanoislands achieves 25mA/cm 2 theoretically, which shows a 76.9% enhancement compared with that of bare silicon. Moreover, the structure also provides superior photocurrent densities at large angles of incidence, compared with conventional antireflection coatings.

Original languageEnglish
Pages (from-to)135-142
Number of pages8
JournalProgress in Photovoltaics: Research and Applications
Volume20
Issue number2
DOIs
StatePublished - 1 Mar 2012

Keywords

  • antireflection
  • colloidal lithography
  • light trapping
  • thin-film solar cell

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