Anomalous electrostatics and intrinsic variability in GeOI p-MOSFET

Chang Hung Yu, Pin Su

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We have reported anomalous electrostatic behaviors in drain-induced-barrier-lowering (DIBL), threshold voltage (VT) roll-off, subthreshold swing (SS), and intrinsic VT variability in GeOI p-MOSFET. The underlying mechanism responsible for these anomalous electrostatic characteristics is attributed to the valence-band offset between Ge channel and Si substrate due to their significant discrepancy in bandgap. This band offset results in an effective built-in forward body bias in GeOI pFET, and leads to different carrier profiles between GeOI pFET and nFET.

Original languageEnglish
Title of host publication2014 Silicon Nanoelectronics Workshop, SNW 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479956777
DOIs
StatePublished - 4 Dec 2015
EventSilicon Nanoelectronics Workshop, SNW 2014 - Honolulu, United States
Duration: 8 Jun 20149 Jun 2014

Publication series

Name2014 Silicon Nanoelectronics Workshop, SNW 2014

Conference

ConferenceSilicon Nanoelectronics Workshop, SNW 2014
CountryUnited States
CityHonolulu
Period8/06/149/06/14

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