Anchoring energy enhancement for plasma alignment technology

Chih Yi Hsu; Tse Hsien Lee; Huang-Ming Chen; Hui Chien J. Kuo; Yi Fan Chen; Chin Yang Lee; Yin Chang Lin; Yao Jane Hsu

doi:10.1889/1.3256636

Anchoring energy enhancement for plasma alignment technology

Chih Yi Hsu, Tse Hsien Lee, Huang-Ming Chen, Hui Chien J. Kuo, Yi Fan Chen, Chin Yang Lee, Yin Chang Lin, Yao Jane Hsu

National Chiao Tung University

Research output: Contribution to journal › Conference article › peer-review

Abstract

The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

Original language	English
Pages (from-to)	1634-1636
Number of pages	3
Journal	Digest of Technical Papers - SID International Symposium
Volume	40
Issue number	1
DOIs	https://doi.org/10.1889/1.3256636
State	Published - 1 Jan 2009
Event	2009 Vehicles and Photons Symposium - Dearborn, MI, United States Duration: 15 Oct 2009 → 16 Oct 2009

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title = "Anchoring energy enhancement for plasma alignment technology",

abstract = "The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell{\textquoteright}s EO properties by new plasma treatment were comparable to the rubbed PI surface.",

author = "Hsu, {Chih Yi} and Lee, {Tse Hsien} and Huang-Ming Chen and Kuo, {Hui Chien J.} and Chen, {Yi Fan} and Lee, {Chin Yang} and Lin, {Yin Chang} and Hsu, {Yao Jane}",

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language = "English",

volume = "40",

pages = "1634--1636",

journal = "Digest of Technical Papers - SID International Symposium",

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Anchoring energy enhancement for plasma alignment technology. / Hsu, Chih Yi; Lee, Tse Hsien; Chen, Huang-Ming; Kuo, Hui Chien J.; Chen, Yi Fan; Lee, Chin Yang; Lin, Yin Chang; Hsu, Yao Jane.

In: Digest of Technical Papers - SID International Symposium, Vol. 40, No. 1, 01.01.2009, p. 1634-1636.

Research output: Contribution to journal › Conference article › peer-review

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T1 - Anchoring energy enhancement for plasma alignment technology

AU - Hsu, Chih Yi

AU - Lee, Tse Hsien

AU - Chen, Huang-Ming

AU - Kuo, Hui Chien J.

AU - Chen, Yi Fan

AU - Lee, Chin Yang

AU - Lin, Yin Chang

AU - Hsu, Yao Jane

PY - 2009/1/1

Y1 - 2009/1/1

N2 - The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

AB - The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

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M3 - Conference article

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JO - Digest of Technical Papers - SID International Symposium

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Anchoring energy enhancement for plasma alignment technology

Abstract

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