Amorphous-layer regrowth and activation of P and as implanted Si by low-temperature microwave annealing

Fu Kuo Hsueh*, Yao Jen Lee, Kun Lin Lin, Michael I. Current, Ching Yi Wu, Tien-Sheng Chao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

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Engineering & Materials Science

Chemical Compounds