AlGaAs/InGaAs high electron mobility transistor grown on Si substrate with Ge/GexSi1-x metamorphic buffer layers

Edward Yi Chang, Jui Chien Huang, Yueh Chin Lin, Yen Chang Hsieh, Chia Yuan Chang

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Al0.12Ga0.88As/In0.18Ga0.82As high-electron-mobility transistor (HEMT) growth on a Si substrate using the Ge/GexSi1-x buffer is demonstrated. This is the first demonstration of Al0.12Ga0.88As/In0.18Ga 0.82As HEMT growth on a Ge/GexSi1-x metamorphic buffer layer. The electron mobility in the In0.18Ga0.82As channel of the HEMT sample was 3,550cm2/(V·s). After fabrication, the HEMT device demonstrated a saturation current of 150mA/mm with a transconductance of 155 mS/ mm. The well behaved characteristics of the HEMT device on the Si substrate are believed to be due to the very thin buffer layer achieved and the lack of the antiphase boundary (APB) formation and Ge diffusion into the GaAs layers.

Original languageEnglish
Pages (from-to)7069-7072
Number of pages4
JournalJapanese journal of applied physics
Volume47
Issue number9 PART 1
DOIs
StatePublished - 12 Sep 2008

Keywords

  • GaAs on Si
  • HEMT
  • SiGe buffer layer

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