@inproceedings{6c0bd852895440b5b938c9f195d01bc7,
title = "Ablation lithography for TFT-LCD",
abstract = "Ablation lithography is based on the photo-decomposition ablation of polymer materials by excimer laser. It is a self-development process, and accordingly possible to reduce the throughput time and manufacturing cost of TFT-LCD. The major alterations from the conventional photolithography are the resist material and the mask. Developing both the technologies and using an experimental exposure& aligner, we fabricated a TFT pattern on 300 × 400 mm2 glass substrate. The result proves the feasibility of EAL as an high throughput lithography suitable for a-Si TFT.",
author = "Kenkichi Suzuki and Nobuaki Hayashi and Hiroshi Masuhara and Lippert, {Thomas K.}",
year = "2001",
month = dec,
day = "1",
doi = "10.1557/PROC-685-D1.2.1",
language = "English",
isbn = "1558996214",
series = "Materials Research Society Symposium Proceedings",
pages = "1--10",
booktitle = "Advanced Materials and Devices for Large-Area Electronics",
note = "null ; Conference date: 16-04-2001 Through 20-04-2001",
}