A systematic investigation of work function in advanced metal gate-HfO2-SiO2 structures with bevel oxide

Atsushi Kuriyama*, Jérôme Mitard, Olivier Faynot, Laurent Brévard, Laurence Clerc, Amélie Tozzo, Vincent Vidal, Simon Deleonibus, Hiroshi Iwai, Sorin Cristoloveanu

*Corresponding author for this work

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