A study of oxide patterning on titanium thin films using scanning probe microscopy

Huey Ru Tsai, Tsung-Eong Hsien, Shih Che Lo, Hsi Hsiang Lin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This work studies the fabrication of oxide patterns on titanium (Ti) thin films using scanning probe microscopy (SPM). We employed three different SPM techniques, namely, AFM in contact mode, lift mode incorporated with contact mode AFM, and STM. It was found that bias voltages, scanning speed, scanning height of the probe (for lift mode), and setpoint current (for STM) play important roles in forming the attainable oxide features. Among these three methods, contact mode AFM exhibited the best patterning efficiency and stability and this method was adopted to oxidize the I-shaped Ti films. The resistance of I-shaped specimen after anoxidization raised from 10 to 10 8 -10 which evidenced the occurrence of oxidation in Ti.

Original languageEnglish
Title of host publicationProceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
PublisherIEEE Computer Society
Pages218-222
Number of pages5
ISBN (Electronic)0780372158
DOIs
StatePublished - 1 Jan 2001
Event1st IEEE Conference on Nanotechnology, IEEE-NANO 2001 - Maui, United States
Duration: 28 Oct 200130 Oct 2001

Publication series

NameProceedings of the IEEE Conference on Nanotechnology
Volume2001-January
ISSN (Print)1944-9399
ISSN (Electronic)1944-9380

Conference

Conference1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
CountryUnited States
CityMaui
Period28/10/0130/10/01

Fingerprint Dive into the research topics of 'A study of oxide patterning on titanium thin films using scanning probe microscopy'. Together they form a unique fingerprint.

Cite this