A Silicidation-Induced Process Consideration for Forming Scale-Down Silicided Junction

Huang-Chung Cheng, M. H. Juang, C. T. Lin, L. M. Huang

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


A process consideration for forming silicided shallow junctions, arising from silicidation process, has been discussed. The CoSi2 shallow p + n junctions formed by various schemes are characterized. The scheme that implants BF‡ ions into thin Co films on Si substrates and subsequent silicidation yields good junctions, but the problems about the dopant drive-in and knock- on of metal deeply degrade this scheme. In the regime that implants the dopant into Si and then Co deposition, however, a large perimeter leakage of 0.1 nA/cm is caused. Generation current, associated with a defect-enhanced diffusion of Co in Si during silicidation, dominates the leakage. A high-temperature pre-activation prior to Co deposition reduces the perimeter leakage to 0.038 nA/cm but which deepens the junctions.

Original languageEnglish
Pages (from-to)342-344
Number of pages3
JournalIEEE Electron Device Letters
Issue number9
StatePublished - 1 Jan 1994

Fingerprint Dive into the research topics of 'A Silicidation-Induced Process Consideration for Forming Scale-Down Silicided Junction'. Together they form a unique fingerprint.

Cite this