A photonic device compatible process in fabricating tunable Fabry-Perot filter

W. T. Lin, Jin-Chern Chiou*, Bruce C.S. Chou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


A photonic device compatible low temperature process that is suitable for fabricating tunable Fabry-Perot filter is proposed in this paper. The advantages of the presented process consist of (1) materials used in this process are compatible with existing optical or IC process; (2) process and detected spectra are not limited by different substrates. Experimental results of the manufactured tunable Fabry-Perot filter indicated that the full-width-half-maximum (FWHM) is closed to 1.3 nm and the measurement of reflectance of distributed Bragg reflectors is up to 99%. Note that within the 10 nm experimental tuning range, the FWHM is kept close to 1.3 nm with tuning voltage from 0 to 30 V. The experimental results showed that the presented process has potential to apply to wavelength division multiplexing (WDM) specifications of optical telecommunication. In particular, the process would also be integrated to fabricate tunable VCSEL processes.

Original languageEnglish
Pages (from-to)149-154
Number of pages6
JournalOptics Communications
Issue number3-6
StatePublished - 15 Sep 2002

Fingerprint Dive into the research topics of 'A photonic device compatible process in fabricating tunable Fabry-Perot filter'. Together they form a unique fingerprint.

Cite this