@inproceedings{e2bdf57bc70b4fa6b113f4c80fb8d5e8,
title = "A parallel intelligent OPC technique for design and fabrication of VLSI circuit",
abstract = "We in this paper develop a parallel intelligent optical proximity correction technique for process distortion compensation of layout mask. This approach integrates an improved genetic algorithm, the rule- and model-based methods, and a parallel domain decomposition algorithm to perform the mask correction on a Linux-based PC cluster with message passing interface libraries. Testing on several fundamental patterns and application to VLSI circuits, this approach shows good correction accuracy and efficiency. Benchmark results, such as speedup, and parallel efficiency are achieved and exhibit excellent parallel performance. This is a constructive approach to developing advanced computer aided design tools for design and fabrication of integrated circuits.",
keywords = "CAD, Domain decomposition, Genetic algorithm, Lithography, Modeling and simulation, OPC, Parallel computing",
author = "Yu, {Shao Ming} and Yiming Li",
year = "2005",
language = "English",
isbn = "0976798522",
series = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",
pages = "724--727",
editor = "M. Laudon and B. Romanowicz",
booktitle = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",
note = "null ; Conference date: 08-05-2005 Through 12-05-2005",
}