A novel program-erasable capacitor using high-κ AlN dielectric

C. H. Lai*, M. W. Ma, C. F. Cheng, Albert Chin, S. P. McAlister, C. X. Zhu, M. F. Li, D. L. Kwong

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Engineering & Materials Science