A novel nanofabrication technique for the array of nanogap electrodes

Jeng-Tzong Sheu*, Chia Chen Chen, Lin Chiang Sung, Lieh Sheu Meng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrate that nanogap between gold and poly-Si electrodes can be defined without using e-beam lithography. The technique showed that reproducible nanogap distance of around 10 nm on the six-inch wafer be easily obtained. Binding of 15 nm gold nanoparticles across the 10 nm electrodes leading to a drastic change of the electrical conductance has also been observed. The key fabrication process was utilized the spacer as sacrificial layer to define the distance of the nanogap between the electrodes. Figure 1 shows the fabrication procedure of array of nanogap electrodes. Structures of nanogap were formed in the crossing region of two electrodes after removal of the sacrificial material, as shown in fig 2. The feature size of nanogap electrodes fabricated using this technology is mainly limited by the thickness of spacer. Further experiments have shown that a 10 nm gap can be successfully obtained, as shown in fig. 3(a). Then, deposition of gold nanoparticles on nanogap electrodes after functionalized the surface of electrodes with amino group was performed for investigation of electrical properties, as shown in fig. 3(b). Figure 3(c) shows a measurement of the I-V characteristics of a typical device before and after gold colloidal interaction on the nanogap. As can be clearly identified, the interaction with colloids leads to a drastic change of the device conductivity. Under bias of 3 volts, the current changes from 2 pA to 30 nA after deposition of 15 nm gold nanoparticles. We believed that this technique can be contributed to the development of high-density nanogap electrodes for applications in biomolecular or nanoparticles detection.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2005
Subtitle of host publication2005 International Microprocesses and Nanotechnology Conference
Pages148-149
Number of pages2
DOIs
StatePublished - 1 Dec 2005
Event2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan
Duration: 25 Oct 200528 Oct 2005

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference
Volume2005

Conference

Conference2005 International Microprocesses and Nanotechnology Conference
CountryJapan
CityTokyo
Period25/10/0528/10/05

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    Sheu, J-T., Chen, C. C., Sung, L. C., & Meng, L. S. (2005). A novel nanofabrication technique for the array of nanogap electrodes. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference (pp. 148-149). [1595257] (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005). https://doi.org/10.1109/IMNC.2005.203781