A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

Bing Rui Lu, Yifang Chen*, Shao Wei Wang, Ejaz Huq, Edward Rogers, Tsung-Sheng Kao, Xin Ping Qu, Ran Liu, Nikolay I. Zheludev

*Corresponding author for this work

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

Original languageEnglish
Pages (from-to)1506-1508
Number of pages3
JournalMicroelectronic Engineering
Volume87
Issue number5-8
DOIs
StatePublished - 1 May 2010

Keywords

  • Electron beam lithography
  • Nanofabrication
  • Nanolens
  • Self-aligned nanolithography
  • Wet/dry etching

Fingerprint Dive into the research topics of 'A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography'. Together they form a unique fingerprint.

  • Cite this

    Lu, B. R., Chen, Y., Wang, S. W., Huq, E., Rogers, E., Kao, T-S., Qu, X. P., Liu, R., & Zheludev, N. I. (2010). A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography. Microelectronic Engineering, 87(5-8), 1506-1508. https://doi.org/10.1016/j.mee.2009.11.064