A new scaling methodology for the 0.1 - 0.025μm MOSFET

C. Fiegna, H. Iwai, T. Wada, T. Saito, E. Sangiorgi, B. Ricco

Research output: Contribution to journalConference article

51 Scopus citations
Original languageEnglish
Article number760231
Pages (from-to)33-34
Number of pages2
JournalDigest of Technical Papers - Symposium on VLSI Technology
DOIs
StatePublished - 1993
Event1993 13th Symposium on VLSI Technology, VLSIT 1993 - Kyoto, Japan
Duration: 17 May 199319 May 1993

Cite this