A high performance BiCMOS technology using 0.25 μm CMOS and double poly 47 GHz bipolar

G. G. Shahidi, J. Warnock, B. Davari, B. Wn, Y. Taur, C. Wong, C. L. Chen, M. Rodriguez, D. D. Tang, K. Jenkins, P. A. Mcfarland, R. Schulz, D. Zichcrman, P. Coanc, D. Klaus, J. Y.C. Sun, M. Polcari, T. H. Ning

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Scopus citations

Abstract

By merging a 0.25 /an CMOS proccss and a 0.4 //m emitter width, 47 GHz fT self-aligned bipolar process, a high performance BiCMOS technology has been developed. Decoupling of the CMOS and bipolar fabrication steps allows optimum process conditions for both the bipolar and the CMOS. CMOS ring oscillators with 50 psec delay per stage at 2.5 volt supply, ECL ring oscillator delays of 48 psec at 1.2 niA, and fast loaded BiNMOS gate delays arc demonstrated.

Original languageEnglish
Title of host publication1992 Symposium on VLSI Technology - Digest of Technical Papers, VLSI Technology 1992
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages28-29
Number of pages2
ISBN (Electronic)0780306988
DOIs
StatePublished - 1992
Event1992 Symposium on VLSI Technology - Digest of Technical Papers, VLSI Technology 1992 - Seattle, United States
Duration: 2 Jun 19924 Jun 1992

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
Volume1992-June
ISSN (Print)0743-1562

Conference

Conference1992 Symposium on VLSI Technology - Digest of Technical Papers, VLSI Technology 1992
CountryUnited States
CitySeattle
Period2/06/924/06/92

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    Shahidi, G. G., Warnock, J., Davari, B., Wn, B., Taur, Y., Wong, C., Chen, C. L., Rodriguez, M., Tang, D. D., Jenkins, K., Mcfarland, P. A., Schulz, R., Zichcrman, D., Coanc, P., Klaus, D., Sun, J. Y. C., Polcari, M., & Ning, T. H. (1992). A high performance BiCMOS technology using 0.25 μm CMOS and double poly 47 GHz bipolar. In 1992 Symposium on VLSI Technology - Digest of Technical Papers, VLSI Technology 1992 (pp. 28-29). [200630] (Digest of Technical Papers - Symposium on VLSI Technology; Vol. 1992-June). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/VLSIT.1992.200630