A High-Density MOS Static RAM Cell Using the Lambda Bipolar Transistor

Chung-Yu Wu, Yih Fang Liu

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Based upon the common-collector lambda bipolar transistor (LBT), which is built with p-well NMOS, and the parasitic n-p-n BJT in a CMOS IC, a novel MOS static RAM cell called the LBT cell is proposed. In this new cell, the LBT and two poly-Si resistors form a bistable element with a PMOS access transistor. With the minimum feature size F, the optimal cell area of 32 F2 can be realized by using the silicide contact and small p-well spacing. The READ-WRITE operation is simulated. Due to the need of precharging before reading and the rather slow recovery after reading, suitable peripheral circuits should be designed.

Original languageEnglish
Pages (from-to)222-224
Number of pages3
JournalIEEE Journal of Solid-State Circuits
Volume18
Issue number2
DOIs
StatePublished - 1 Jan 1983

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