A CVD epitaxial deposition in a vertical barrel reactor: Process modeling using cluster-based fuzzy logic models

Jin-Chern Chiou*, J. Y. Yang

*Corresponding author for this work

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

A chemical vapor deposition (CVD) epitaxial deposition process modeling using fuzzy logic models (FLM's) has been proposed. The process modeling algorithm consists of a cluster estimation method and backpropagation algorithm to construct a number of modeling structures from the training data. A decision rule based on the multiple correlation factor is used to obtain the optimum structure of fuzzy model using the testing data. Upon the optimum structure has been reached, the gradient-descent method is used to refer the parameters of the final fuzzy model using both training and testing data. The algorithm has been applied to a nonlinear function and a vertical chemical vapor deposition process. The results demonstrate the efficiency and effectiveness of the proposed fuzzy logic model in comparison with existing fuzzy logic models and artificial neural network models.

Original languageEnglish
Pages (from-to)645-653
Number of pages9
JournalIEEE Transactions on Semiconductor Manufacturing
Volume11
Issue number4
DOIs
StatePublished - 1 Dec 1998

Keywords

  • Chemical vapor deposition (CVD) modeling
  • Clustering estimation method
  • Fuzzy logic

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