A coupled simulation and optimization approach to nanodevice fabrication with minimization of electrical characteristics fluctuation

Yi-ming Li*, Shao Ming Yu, Cheng Kai Chen

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

In this paper, a TCAD-simulation-based optimization methodology for nanoscale CMOS device fabrication is advanced. Electrical characteristics fluctuation is considered and minimized in the optimization process. Integration of device and process simulation is performed to evaluate device performances, where the hybrid intelligent approach enables us to extract optimal recipes which are subject to specified device specification. It is known that production of CMOS devices now are in the sub-65 nm region; therefore, electrical characteristics fluctuation should be simultaneously considered when we extract a set of optimal process parameters. Verification of the efficiency and accuracy of the proposed computational methodology is tested and performed on a 65 nm CMOS device. Compared with realistic fabricated and measured data, this approach achieves the performance of on-target design; in the meanwhile, it significantly reduces the threshold voltage fluctuation. We believe this approach provides a novel way to accelerate the tuning of process parameters and benefit technology of nanodevices.

Original languageEnglish
Title of host publication2006 6th IEEE Conference on Nanotechnology, IEEE-NANO 2006
Pages12-15
Number of pages4
DOIs
StatePublished - 2006
Event2006 6th IEEE Conference on Nanotechnology, IEEE-NANO 2006 - Cincinnati, OH, United States
Duration: 17 Jun 200620 Jun 2006

Publication series

Name2006 6th IEEE Conference on Nanotechnology, IEEE-NANO 2006
Volume1

Conference

Conference2006 6th IEEE Conference on Nanotechnology, IEEE-NANO 2006
CountryUnited States
CityCincinnati, OH
Period17/06/0620/06/06

Keywords

  • Characteristics fluctuation
  • CMOS fabrication
  • Design
  • Modeling
  • Nanodevices
  • Optimization
  • Process and device simulation
  • Process recipe
  • Simulation
  • TCAD

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