A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics

Shi Jin Ding*, H. Hu, Chunxiang Zhu, S. J. Kim, M. F. Li, B. J. Cho, Albert Chin, D. L. Kwong

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

2 Scopus citations

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Engineering & Materials Science