A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications

Che Hao Kang, Yu Min Fu, Chin Chuan Kao, Jia Wei Yang, Ming Liang Tseng, Zih Yu Yu, Yu Ting Cheng, Guan Yu Chen, Pu Wei Wu, Chung Yu Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO2, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.

Original languageEnglish
Title of host publication2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages609-612
Number of pages4
ISBN (Electronic)9781728120072
DOIs
StatePublished - Jun 2019
Event20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII - Berlin, Germany
Duration: 23 Jun 201927 Jun 2019

Publication series

Name2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

Conference

Conference20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
CountryGermany
CityBerlin
Period23/06/1927/06/19

Keywords

  • Cell Culturing
  • Graphene Oxide
  • Inkjet Printing
  • rGO
  • Silicon Shadow Mask
  • SSPM

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    Kang, C. H., Fu, Y. M., Kao, C. C., Yang, J. W., Tseng, M. L., Yu, Z. Y., Cheng, Y. T., Chen, G. Y., Wu, P. W., & Wu, C. Y. (2019). A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. In 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII (pp. 609-612). [8808293] (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/TRANSDUCERS.2019.8808293