A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications

Che Hao Kang; Yu Min Fu; Chin Chuan Kao; Jia Wei Yang; Ming Liang Tseng; Zih Yu Yu; Yu Ting Cheng; Guan Yu Chen; Pu Wei Wu; Chung Yu Wu

doi:10.1109/TRANSDUCERS.2019.8808293

A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications

Che Hao Kang, Yu Min Fu, Chin Chuan Kao, Jia Wei Yang, Ming Liang Tseng, Zih Yu Yu, Yu Ting Cheng, Guan Yu Chen, Pu Wei Wu, Chung Yu Wu

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO₂, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.

Original language	English
Title of host publication	2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	609-612
Number of pages	4
ISBN (Electronic)	9781728120072
DOIs	https://doi.org/10.1109/TRANSDUCERS.2019.8808293
State	Published - Jun 2019
Event	20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII - Berlin, Germany Duration: 23 Jun 2019 → 27 Jun 2019

Publication series

Name	2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

Conference

Conference	20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
Country	Germany
City	Berlin
Period	23/06/19 → 27/06/19

Keywords

Cell Culturing
Graphene Oxide
Inkjet Printing
rGO
Silicon Shadow Mask
SSPM

Access to Document

10.1109/TRANSDUCERS.2019.8808293

Link to publication in Scopus

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Cite this

Kang, C. H., Fu, Y. M., Kao, C. C., Yang, J. W., Tseng, M. L., Yu, Z. Y., Cheng, Y. T., Chen, G. Y., Wu, P. W., & Wu, C. Y. (2019). A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. In 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII (pp. 609-612). [8808293] (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/TRANSDUCERS.2019.8808293

Kang, Che Hao ; Fu, Yu Min ; Kao, Chin Chuan ; Yang, Jia Wei ; Tseng, Ming Liang ; Yu, Zih Yu ; Cheng, Yu Ting ; Chen, Guan Yu ; Wu, Pu Wei ; Wu, Chung Yu. / A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII. Institute of Electrical and Electronics Engineers Inc., 2019. pp. 609-612 (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII).

@inproceedings{d27a37764c8048ec93f6db54d570a242,

title = "A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications",

abstract = "This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO2, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.",

keywords = "Cell Culturing, Graphene Oxide, Inkjet Printing, rGO, Silicon Shadow Mask, SSPM",

author = "Kang, {Che Hao} and Fu, {Yu Min} and Kao, {Chin Chuan} and Yang, {Jia Wei} and Tseng, {Ming Liang} and Yu, {Zih Yu} and Cheng, {Yu Ting} and Chen, {Guan Yu} and Wu, {Pu Wei} and Wu, {Chung Yu}",

year = "2019",

month = jun,

doi = "10.1109/TRANSDUCERS.2019.8808293",

language = "English",

series = "2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

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booktitle = "2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII",

note = "null ; Conference date: 23-06-2019 Through 27-06-2019",

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Kang, CH, Fu, YM, Kao, CC, Yang, JW, Tseng, ML, Yu, ZY, Cheng, YT, Chen, GY, Wu, PW & Wu, CY 2019, A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. in 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII., 8808293, 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII, Institute of Electrical and Electronics Engineers Inc., pp. 609-612, 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII, Berlin, Germany, 23/06/19. https://doi.org/10.1109/TRANSDUCERS.2019.8808293

A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. / Kang, Che Hao; Fu, Yu Min; Kao, Chin Chuan; Yang, Jia Wei; Tseng, Ming Liang; Yu, Zih Yu; Cheng, Yu Ting; Chen, Guan Yu; Wu, Pu Wei ; Wu, Chung Yu.

2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII. Institute of Electrical and Electronics Engineers Inc., 2019. p. 609-612 8808293 (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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T1 - A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications

AU - Kang, Che Hao

AU - Fu, Yu Min

AU - Kao, Chin Chuan

AU - Yang, Jia Wei

AU - Tseng, Ming Liang

AU - Yu, Zih Yu

AU - Cheng, Yu Ting

AU - Chen, Guan Yu

AU - Wu, Pu Wei

AU - Wu, Chung Yu

PY - 2019/6

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N2 - This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO2, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.

AB - This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO2, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.

KW - Cell Culturing

KW - Graphene Oxide

KW - Inkjet Printing

KW - rGO

KW - Silicon Shadow Mask

KW - SSPM

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U2 - 10.1109/TRANSDUCERS.2019.8808293

DO - 10.1109/TRANSDUCERS.2019.8808293

M3 - Conference contribution

AN - SCOPUS:85071943810

T3 - 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

SP - 609

EP - 612

BT - 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

PB - Institute of Electrical and Electronics Engineers Inc.

Y2 - 23 June 2019 through 27 June 2019

ER -

Kang CH, Fu YM, Kao CC, Yang JW, Tseng ML, Yu ZY et al. A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications. In 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII. Institute of Electrical and Electronics Engineers Inc. 2019. p. 609-612. 8808293. (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII). https://doi.org/10.1109/TRANSDUCERS.2019.8808293