@inproceedings{d27a37764c8048ec93f6db54d570a242,
title = "A Combined Process of Silicon Shadow Masking and Inkjet Printing (SSMP) for Making Graphene Oxide and Reduced Graphene Oxide Microstructures for Selective Cell Culturing Applications",
abstract = "This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 μm on varieties of substrates, such as PDMS, SiO2, Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48kΩ/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.",
keywords = "Cell Culturing, Graphene Oxide, Inkjet Printing, rGO, Silicon Shadow Mask, SSPM",
author = "Kang, {Che Hao} and Fu, {Yu Min} and Kao, {Chin Chuan} and Yang, {Jia Wei} and Tseng, {Ming Liang} and Yu, {Zih Yu} and Cheng, {Yu Ting} and Chen, {Guan Yu} and Wu, {Pu Wei} and Wu, {Chung Yu}",
year = "2019",
month = jun,
doi = "10.1109/TRANSDUCERS.2019.8808293",
language = "English",
series = "2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "609--612",
booktitle = "2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII",
address = "United States",
note = "null ; Conference date: 23-06-2019 Through 27-06-2019",
}