1990 …2022

Research output per year

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Research Output

Review article

Low-temperature microwave annealing processes for future IC fabrication-A review

Lee, Y. J., Cho, T. C., Chuang, S. S., Hsueh, F. K., Lu, Y. L., Sung, P. J., Chen, H. C., Current, M. I., Tseng, T-Y., Chao, T-S., Hu, C-M. & Yang, F. L., 1 Jan 2014, In : IEEE Transactions on Electron Devices. 61, 3, p. 651-665 15 p., 6737220.

Research output: Contribution to journalReview article

39 Scopus citations

Evaluation of plasma charging damage in ultrathin gate oxides

Lin, H-C., Chen, C. C., Chien, C-H., Hsein, S. K., Wang, M. F., Chao, T-S., Huang, T. Y. & Chang, C. Y., 1 Mar 1998, In : IEEE Electron Device Letters. 19, 3, p. 68-70 3 p.

Research output: Contribution to journalReview article

27 Scopus citations