Multi-chamber Plasma Etching System(P5000E)

    Bing-Yue Tsui (Manager), 進章 胡 (Operator) & 正維 李 (Operator)

Equipment/facility: Equipment

  • Location

    固態電子系統大樓1樓R127實驗室

    Taiwan

Equipments Details

Description

功能: (1) 蝕刻二氧化矽、氮化矽、複晶矽.
重要規格: (1) 晶圓尺寸:4吋. (2) 使用氣體包含Cl2、HBr、CF4、CHF3、O2、Ar、He、N2
Photo associated with equipment

Details

NameApplied Materials / Precision 5000
Acquisition date1/01/90
ManufacturersApplied Materials Inc

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