Mask Aligner

Equipment/facility: Equipment

  • Location

    固態電子系統大樓 1樓120實驗室

    Taiwan

Equipments Details

Description

重要規格:(1) MASK Dimension:5"x5"/4"x4". (2) Wafer size: ~4" . (3) Exposure size: 3". (4) Chuck: W 3". (5) High Lamp 350W. (6) Microscope Type: M 400 BF. (7) Double Vacuum pump. (8) Exposure Power Supply: CIC 500. (9) Exposure option:Option UV 300. (10) 汞燈光源:350nm~450nm
服務項目:各種元件之對準曝光
Photo associated with equipment

Details

NameKarl-Suss MJB-3
Acquisition date1/03/88
ManufacturersSUSS MicroTec
NameKarl-Suss MJB-3
Acquisition date1/01/91
ManufacturersSUSS MicroTec