Laser Pattern Generator(DWL-200)

Equipment/facility: Equipment

  • Location

    固態電子系統大樓 10級R 139實驗室

    Taiwan

Equipments Details

Description

重要規格:(1)雷射光源442nm(g-line) Helium _Cadmium LASER Power 125mW. (2)Minimum feature size is .80um. (3)最大有效區域 200mm x 200mm. (4)GDSII 及 Auto CAD 之 *. dxf 檔. (5)Dual CCD camera alignment system.
服務項目:玻璃光罩之製造﹝4”、5”及6”﹞, 5吋石英光罩(電洽)
Photo associated with equipment

Details

NameLaser Pattern Generator(DWL-200)
Acquisition date1/04/07
ManufacturersHindustan Institute of Maritime Training

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