Laser Pattern Generator

Equipment/facility: Equipment

  • Location

    固態電子系統大樓 1樓 118實驗室

    Taiwan

Equipments Details

Description

重要規格: (1) 雷射光源442nm(g-line) Helium _Cadmium LASER Power70mW. (2) Smallest feature size is 2um at effective NA 0.5
. (3) 吋光罩有效區域 8cm x 8cm, 5吋光罩圖案有效區域 10cm x 10 cm
. (4) Maximum die's number 256. (5) GDSII DATA _INPUT 及 Auto CAD 之 *. dxf 檔. (6) Dual CCD camera alignment system
服務項目:4"玻璃、5"玻璃光罩之製造
Photo associated with equipment

Details

NameHIMT DWL_2.0
Acquisition date1/10/93
ManufacturersHindustan Institute of Maritime Training

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