Dual E-Gun Evaporation System A

Equipment/facility: Equipment

  • Location

    固態電子系統大樓 3 樓實驗室

    Taiwan

Equipments Details

Description

功能: (1) 可用於多層薄膜蒸鍍(限半導體製程常用之材料)

重要規格: (1) EB gun Model EGK-3M*2.5kw EB power 2台. (2) 抽氣系統:RP + Cryo pump U-10 pu(2300 L/S N2),最低壓力2*10¯6Torr. (3) 基板大小:4吋晶片18片或 6吋晶片3片+ 4吋6片

Details

NameULVAC EBX-10C
Acquisition date1/05/93
ManufacturersULVAC, Inc.

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