Equipments Details
Description
功能: (1) 薄膜蒸鍍(限半導體製程常用之材料)
重要規格: (1) EB gun Model EGL-35M * 5kw EB power. (2) Cryo pump U-10 pu(2300 L/S N2),最低壓力3.0E-7 Torr. (3) 基板大小:4"、6"
重要規格: (1) EB gun Model EGL-35M * 5kw EB power. (2) Cryo pump U-10 pu(2300 L/S N2),最低壓力3.0E-7 Torr. (3) 基板大小:4"、6"

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Details
Name | ULVAC EBX-10C |
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Acquisition date | 1/05/93 |
Manufacturers | ULVAC, Inc. |
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