Dual E-Gun Evaporation B System

Equipment/facility: Equipment

  • Location

    固態電子系統大樓 3 樓實驗室

    Taiwan

Equipments Details

Description

功能: (1) 薄膜蒸鍍(限半導體製程常用之材料)

重要規格: (1) EB gun Model EGL-35M * 5kw EB power. (2) Cryo pump U-10 pu(2300 L/S N2),最低壓力3.0E-7 Torr. (3) 基板大小:4"、6"

Details

NameULVAC EBX-10C
Acquisition date1/05/93
ManufacturersULVAC, Inc.

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