Dielectric Material RIE 200L

    Bing-Yue Tsui (Manager), 進章 胡 (Operator) & 正維 李 (Operator)
Institute of Electronics

Equipment/facility: Equipment

  • Location

    固態電子系統大樓 1樓116實驗室

    Taiwan

Equipments Details

Description

功能：
蝕刻二氧化矽、氮化矽及未經後段製程之High-K(ALD,MOCVD)等材料
重要規格： (1) RF產生器最大可輸出300W，頻率13.56MHz，本蝕刻系統可通入CF4、O2、SF6、CHF3等氣體蝕刻二氧化矽、氮化矽等材料。(試片上不得有摻雜及金屬材料)
Photo associated with equipment

Details

NameSamCo RIE200L
Acquisition date1/12/02
Manufacturers Samco Inc.

Contact Information

NameBing-Yue Tsui
Phone胡進章 先生 (TEL：03-5712121-55607, 55666)
Mobile 李正維 先生 (TEL：03-5712121-55660, 55666)
Emailsjackhu@faculty.nctu.edu.tw cwlee@nctu.edu.tw
Web addressesWebsite, Booking/Management

Terms of loan/booking

Available for loan - internal and external

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